Reactive Ion Etching (RIE) System

Our RIE-300 system manufactured by Torr International is equipped with a turbo molecular pump that can provide a clean etch environment and a highly anisotropic etch with no undercutting. The sample chamber can accomodate up to 6" in diameter of samples/wafers of any shape. It is also equipped with 3 mass flow controllers with shut-off valves and an internal gas shower for uniform gas distribution within the reaction area.