Pulsed Laser Deposition (PLD) System

The Pulsed Laser Deposition system is equipped with a Lambda Physik excimer laser with variable power output (up to 50 Watts), which is used to ablate the desired deposition material. The deposition chamber has a computer controlled, rotating target holder accommodating rapid multilayer film growth. The system also features a Kauffman type ion gun, making ion assisted depositions possible.