Multi-target DC/RF Magnetron Sputtering System
The magnetron electron beam sputtering system operates at ~70 mTorr and 0.05 mA beam current with a potential of several hundred volts. It is useful for despositing a uniform thin film of target material onto a sample. Targets include silver, copper and gold and several other insulating materials.
Picture:
![magnetron electron beam sputtering machine](/sites/thinfilm/files/images/2022/Facilities/sputtering.jpg)
Equipment type:
Preparation and Fabrication