Mask Aligner with UV Exposure for Photolithography

This system facilitates transfer of circuit and device designs onto a thin film sample or wafer by exposing parts of the polymer-covered sample/wafer to ultraviolet radiation using a photolithographic mask pattern. This process is a precursor to chemical wet etching, ion beam milling or reactive ion etching.

Mask Aligner machine
Equipment type: 
Preparation and Fabrication