Multi-target DC/RF Magnetron Sputtering System


The magnetron electron beam sputtering system operates at ~70 mTorr and 0.05 mA beam current with a potential of several hundred volts. It is useful for despositing a uniform thin film of target material onto a sample. Targets include silver, copper and gold and several other insulating materials.

Picture: 
magnetron electron beam sputtering machine
Equipment type: 
Preparation and Fabrication