Department of Physics and Astronomy

Multi-target DC/RF Magnetron Sputtering System

Wed, 07/17/2013 - 11:38 -- Melisa Xin

The magnetron electron beam sputtering system operates at ~70 mTorr and 0.05 mA beam current with a potential of several hundred volts. It is useful for despositing a uniform thin film of target material onto a sample. Targets include silver, copper and gold and several other insulating materials.

Equipment type: 
Preparation and Fabrication

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