Department of Physics and Astronomy

Mask Aligner with UV Exposure for Photolithography

Wed, 07/17/2013 - 11:49 -- Melisa Xin

This system facilitates transfer of circuit and device designs onto a thin film sample or wafer by exposing parts of the polymer-covered sample/wafer to ultraviolet radiation using a photolithographic mask pattern. This process is a precursor to chemical wet etching, ion beam milling or reactive ion etching.

Equipment type: 
Preparation and Fabrication

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