Atomic Layer Deposition
Atomic layer deposition (ALD) is a thin-film deposition technique that allows for even growth of a material over three-dimensional surfaces. It is especially useful because the growth occurs atomic layer by atomic layer in a self-limiting chemical reaction. This allows for the growth of ultrathin film with pristine quality and excellent conformity. We are utilizing this technique to fabricate novel supercapacitors by growing thin, high-k dielectric materials over patterened three-dimensional surfaces.